A Residual Gas Analyser configured for demanding UHV applications

Measures the concentration of gases and vapours in real time

The Hiden RGA for UHV are designed and configured for residual gas analysis in demanding UHV applications where critical measurements at UHV are required.

Overview

The HAL 201 RC analyser includes, as standard, gold plated versions of all ion source types. The gold plated ion source is provided to minimise source outgassing, suited for applications where total pressure is < 5 x 10-10 mbar.

Features

  • EPICS is the standard instrument control software used in many light sources around the world and the Hiden HAL system is fully compatible with EPICS software drivers.
  • Gold plated ion sources to minimise source outgassing
  • Electron impact ioniser with twin oxide coated Iridium filament
  • Dual Faraday/channeltron electron multipler detector
  • Minimum detectable partial pressure of 5 x 10-14 mbar
  • Maximum operating pressure of 1 x 10-4 mbar

Specifications

Mass range

200 amu

Minimum detectable concentration

5 x 10-14 mbar

Ion Source

Gold plated ion source

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and electron multiplier

Mounting flange

DN-35-CF (2.75"/70mm OD Conflat type)