A range of electron impact ion sources that can be supplied with any of our residual gas analysers
Configures residual gas analysers for specific applications, molecular beam analysis for example
Hiden Analytical produces a wide variety of ion source types which can be fitted to our full range of RGAs. Ion source types are crucial to the performance of a RGA and having the ability to specify which source you require ensures our RGAs are custom configured for specific applications.
Overview
Standard RGA A radially symmetric configuration for general applications
UHV Low Profile Optimised for UHV TPD Studies enabling closer proximity of the ion source to the evolution surface
Closed Source For high pressure studies with direct gas input used in conjunction with a differential pumping stage for the analyser
XBS Cross Beam Configured specifically for MBE deposition rate monitoring and control
Basic Cross Beam Used for analysis of molecular beams, where the beam may be liable to condense on ioniser surfaces. The source features an unobstructed pathway through the ionising region of the source. External shrouds are available to protect the quadrupole mass filter from condesing species
Laser Cross Beam Source Includes two orthagonal unobstructed pathways for laser proton ionisation within the source cage region, providing an alternative to electron impact and electron attachment ionisation
4 Lens Ion Optics with Integrated Ioniser Additionally enables analysis of low energy positive and negative ions generated externally to the analyser. For electron, photon and laser stimulated desorption studies
Platinum Ion Source This source is configured for improved operation in reactive gases. Radially symmetric, UHV compatible
Gold Plated Ion Source This source is configured to minimise the effects of source outgassing. Radially symmetric, UHV campatible. Available as Standard or Low Profile options
Features
Specifications
Standard RGA |
A radially symmetric configuration for general applications |
UHV Low Profile |
Optimised for UHV TPD Studies |
Closed Source |
For direct gas input with differential pumping stage for the analyser |
XBS Cross Beam |
For MBE deposition rate monitoring and control |
Basic Cross Beam |
Use where the beam may be liable to condense on ioniser surfaces |
Laser Cross Beam |
2 orthogonal unobstructed pathways for laser photon ionisation |
4 Lens Ion Optics with Integrated Ioniser |
For electron, photon and laser stimulated desorption studies |
Platinum Ion Source |
For improved operation in reactive gases |
Gold Plated Ion Source |
To minimise the effects of source outgassing at UHV |