LEA-S500 – is a modern powerful atomic - emission spectral instrument with multichannel spectrum registration, combining in itself innovation technologies in the area of laser, spectral, measuring, digital equipment and software and permitting elemental (chemical) analysis of a sample in minutes. The detectable elements are from H to U, measuring range is to 100%. Necessary weight of the analyzed material is from 50 nanograms. The time period of multi-element analysis including sample preparation is 1 – 15 minutes. 400 analyses on determination of material homogeneity take about 7 minutes.
Intuitive software of LEA-S500 guarantees operation of the instrument from the first opeartion. Only several hours and minimum special knowledge is needed to learn basic functions of the device.
Two-pulse nanosecond laser source of spectra excitation, due to high energy, power and temporal stability, provides a maximal reproducibility of the analysis results and low detection limits of chemical elements and compounds. Simultaneously it provides arc and spark modes of spectra excitation.
High-quality light throughput aberration-free high-resolution spectrograph provides accurate and reliable measurements.
Unique detection system of short pulsed light signals provides extremely low limits of elements detection and a linearity of concentration dependences in a wide range.
Our innovative solutions guarantee:
High accuracy and precision determination of elements and their compounds (oxides) in the samples
Low detection limit of elements (from 0.01 ppm to 1ppb)
Analysis of various elements in any conductive, nonconductive solid (monolithic and powder) samples
Use of analytic lines at the optimal concentration sensitivity, free from spectral overlaps
Maximal efficiency of analytical light signal
Ease at operation and service
Safe operation and protection of personnel from harmful factors
Double pulse nano second laser
In the elemental analyzer LEA – S500 plasma of a sample material, arising due to the treatment of material with powerful light pulses, is used as a light source to obtain an atomic - emission spectrum. It has been experimentally revealed, that when a sample is treated with two successive laser pulses (with time delay not exceeding the plasma lifetime) an essential growth of intensity and spectral lines stability in comparison with one-pulse excitation mode is provided. The given effect reduces substantially the lower limit of elements detection, increases measurements accuracy, extends analytical potential owing to excitation of lines with high ionization energy. Detection system
The use of digital cameras with multi-element spectrum detection systems in spectral instruments is conditioned by a number of advantages before the traditional detection systems (photo-electronic multipliers, photo-plates and etc.). The main of them are: the opportunity of simultaneous detection of a wide spectrum range; high-speed performance, providing detection of spectra excited with frequency pulsed sources, what allows one to make a large number of measurements per a time unit (in our case it is 20 times per second); wide range of spectral sensitivity; low dark signals (noise); wide dynamic range. As a radiation receiver in digital cameras matrix charge-coupled devices (CCD) are used, which are referred to the type of photosensitive (photoelectric) charge-transfer devices (CTD). Quantum efficiency of modern semiconductor radiation receivers is 90% and higher. Spectrograph
Spectrograph performs radiation spectral analysis. This analysis is realized in optics by means of an element deviating the beams with various wavelengths to different angles.
Measuring of mass fraction (concentration) of chemical elements or their compounds (oxides) in a sample with minimal sample preparation
analysis Multielement chemical analysis per one measurement
High sensitive and precise measurements in the wide concentration range
No change of a sample aggregate state
Sample analysis in the set points (areas) on the surface by means of positioning system and video surveillance
Layer-by-layer analysis of coatings, films, deposits, corrosion
Analysis of inclusions, flaws, defects
Analysis of elements distribution in a sample with the step from 30 mcm. Mapping of elements distribution over the surface, homogeneity control No need in ultrapure reagents for a sample preparation
No need in expensive consumables
No need in inert gas to solve most of the tasks
Dirty sample surface is cleaned with the preliminary laser pulses
No need in re-configuration or modernization of the instrument to solve all the mentioned tasks
Analysis of conductive, non-conductive materials
Analysis of a wire of any diameter, balls, cylindrical details without additional processing using special
adapters (included in the delivery set) Uncompromising operation safety, complete protection of the personnel from harmful factors
Laser elemental analyzer LEA-S500 is applied for qualitative, semi-quantitative and quantitative elemental (chemical) analysis of raw material, components, additives, admixtures, inclusions at all stages of manufacturing process; for control of finished products at factories; for scientific investigations.
The instrument allows to perform both general averaged multi-element analysis of a sample and local analysis of small
volume and mass.
Multi-element quantitative sample analysis including sample preparation takes from 1 to 15 minutes.
Analysis of any solid-state or powder materials:
ceramics, glass, cement
metals and alloys
rubbers, caoutchoucs, plastics
micro-elements and admixtures in pure materials
ores, minerals and mono-mineral inclusions
natural materials (clays, sands, dolomite, soda, salt and etc.)
ash of herbal and animal origin
solid residue of liquids
dry plant materials
and other materials.
For analysis of solid-state, monolith materials (metals, alloys, glass, ceramics and etc.) no sample preparation is required or it lies in the obtaining of a plane section of a sample surface. For analysis of a transparent sample (glass, crystal) the area of analysis is additionally polished.
For the analysis of powdery samples (refractory components, slags, concentrates, sands, ash, etc.) the materials are ground with the subsequent pressing in tablets. Sample preparation of powder-state materials takes 10 – 40 min; with manual tools and 3 – 5 min; with the help of semi-automatic tools.
100 mg of a sample material is enough for the preparation of a tablet.
Detection limit means a minimal content of the element in a sample, detected with the instrument.
Usually a concentration, at which the analytical signal detected with the instrument equals to a triple value of a standard deviation of noise signal, is taken for a detection limit. Obtaining of such signal is a sufficient reason for making a decision on presence of the searched component.
Detection limit is a parameter sensitive to measurement conditions and a sample characteristic.
with selected detection limits, ppm
1 ppm = 0.0001%
ATILLA 2 Software
ATILLA 2 is a powerful intuitive software instrument for the instrument control and measurements automation.
ATILLA 2 contains:
Spectral lines database
Certified reference materials database
Analyzed samples database (archive)
ATILLA 2 provides:
Automatic sample analysis
Calibration and re-calibration
Graphical imaging of the obtained spectrum
Sample surface observation, selection of any point or area for the analysis
Possibility for development of analytical programs by a user (selection of spectra excitation and detection
modes, selection of algorithms of spectral lines mathematical processing, calibration of the instrument) Control of quality and reliability of the analysis results
Printing out the analysis results and their mathematical processing
Memory storage of unlimited number of analytical programs
Control over the instrument and the system state
Auto-calibration of a wavelength scale
Analysis of inclusions and structural components
Material defect is a local change of chemical composition of the material affecting the properties of the material
Flaw (defect) detection is performed by means of comparison of pure glass spectra and the spectra of a defect. The positioning system of the LEA-S500 provides the pointing accuracy of 1 µm. For a qualitative analysis size of defect should be not less than 5 µm and for a quantitative analysis size of defect should be not less than 150 µm.
In the given case the zirconium inclusion indicates the destruction of the refractory laying in a glass-making furnace.
Diagnostics of destruction processes at initial stage allows to take preventive measures and to avoid expensive reconstructions. Time of analysis is about 2 min.
The spectrum of the defect and the pure glass
Distribution of elements over the surface, homogeneity control
The control of elements distribution over the material surface provides new information about the analyzed samples. LEA-S500 allows high accurate, fast and low cost analysis. It also allows to analyze materials with a step of 100 µm.
This type of the analysis is recommended for specification of homogeneity specification at the certification of composition of reference materials.
Concentration map of the element on the sample surface
Successive evaporation of sample material with the focused laser pulses provides elemental (chemical) analysis of composition and thickness of multi-layer coatings and thin films. Deposits, corrosion areas, sections with the damaged structure, composite materials, etc. can be investigated.
Analysis of the mirror surface with minimal path of 2х2 mm, 400 points