A residual gas analyser for vacuum process analysis
Measures the vacuum process gas composition, contamination and leak detection
The HPR-30 is a residual gas analyser configured for analysis of gases and vapours in vacuum processes and for vacuum diagnostics. The system is fully configurable for individual process applications such as CVD, plasma etching, MOCVD, process gas purity and in-process contaminant monitoring.
Overview
The HPR-30 sampling system configuration is for fast response high sensitivity analysis of gas and vapour species in vacuum processes.It is also directly suited to analysis of high mass species and precursors used in ALD and MOCVD applications.
The HPR-30 system features a close-coupled re-entrant aperture for sampling directly within the process region, providing maximum data integrity and fast confirmation of process status. Options include the innovative Hiden 3F series triple filter quadrupole system providing enhanced abundance sensitivity, part-per-billion (ppb) detection levels and high contamination resistance, particularly suited to the analysis of aggressive gases in CVD and RIE applications.
Features
- Triple filter mass spectrometer
- Mass range options 200, 300, 500 or 1000 amu
- Enhanced abundance sensitivity
- Detection to 5 ppb
- APSI-MS soft ionisation mode
Specifications
|
Mass range |
200, 300 or 510 amu |
|
Measures vacuum process gas composition |
Yes |
|
Measures contamination and leak detection |
Yes |
|
Minimum detectable concentration |
5 PPB |
|
Sample inlet pressure (Standard) |
10-3 to 5 mbar |
|
Sample inlet pressure (Optional) |
< 10-4 mbar |
|
Fast measurement speed |
Up to 500 measurements per second |